This carbon (C) sputtering target is a solid carbon source material designed for physical vapor deposition (PVD) processes. In sputtering, energetic ions bombard the target surface, ejecting carbon atoms that condense onto a substrate to form a thin film. Carbon targets belong to the group of inorganic carbon-based materials used in thin-film research and coating development.
- Quantity: 1 piece
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- Deposition of carbon thin films for materials science research
- Development of protective carbon coatings, such as diamond-like carbon layers, for wear resistance studies
- Fabrication of conductive or electrode layers in electronic and energy device research
- Preparation of carbon coatings for optical and surface-science experiments
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