Chromium (Cr) sputtering targets are solid plates of the transition metal chromium, designed for use in physical vapor deposition (PVD) systems. During sputtering, energetic ions eject chromium atoms from the target surface, which then condense onto a substrate to form thin metallic films. This product is listed in the nanomaterial category, and its title also references indium, so any bonding or backing configuration should be confirmed before ordering.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Adhesion and barrier layers in thin-film device research
- Protective and decorative metallic coatings studied in surface engineering
- Metallization steps in microelectronics and optical coating prototypes
- Fundamental studies of metal thin-film growth and deposition processes
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