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Nanografi

Chromium (Cr) Sputtering Targets

Chromium (Cr) Sputtering Targets
Regular price Rp 9.363.000,00
Regular price Sale price Rp 9.363.000,00
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This chromium (Cr) sputtering target from Nanografi has a purity of 99.95%, a size of 3'' and a thickness of 0.125''. It serves as the source material in sputter deposition, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.

Chromium is a hard, brittle, silvery metal that takes a high mirror polish and resists corrosion. These properties make chromium targets a common choice for decorative bright coatings, corrosion-resistant layers and hard wear-protective films, including coatings on engine parts such as piston rings.

Sputter deposition is repeatable and scales from small research projects to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.

  • Physical vapour deposition (PVD) of thin films and functional coatings for electronic components, displays and tools.
  • Shiny decorative and corrosion-resistant coatings for automotive parts such as wheels and bumpers, and for automotive glass.
  • Hard wear-resistant coatings that protect engine components such as piston rings.
  • Thin film layers in photovoltaic cell and battery fabrication.
  • Vacuum chroming of watches, household appliance parts, piston rods, slide valves, mirrors and tinted glass.
  • Sputter etching where high etching anisotropy is required.

Brand Nanografi
CAS number —
Molecular formula —
Purity 99.95%
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Pack sizes 1 piece
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  • Product code: NG0ST01CH18
  • Material: Chromium (Cr)
  • Size: 3''
  • Thickness: 0.125''
  • Product code: NG0ST01CH18

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