Chromium (Cr) sputtering targets are solid metal plates designed for physical vapor deposition (PVD) processes, where argon plasma ejects chromium atoms that condense onto a substrate to form thin metallic films. Chromium is a hard, corrosion-resistant transition metal, and its sputtering targets belong to the broader group of metal and nanomaterial deposition sources used in thin-film research.
- Quantity: 1 piece
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- Adhesion or seed layers in multilayer thin-film stacks
- Protective and decorative coating research
- Electrode and contact layer development in microelectronics
- Surface modification studies for wear and corrosion resistance
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