Chromium (Cr) sputtering targets are solid, high-density plates of chromium metal used as the source material in physical vapor deposition (PVD) processes. During sputtering, energetic ions bombard the target surface and eject chromium atoms that condense onto a substrate to form thin films. Chromium belongs to the transition metal group and is valued for its hardness, corrosion resistance, and good adhesion to many substrates.
- Quantity: 1 piece
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- Adhesion and seed layers in thin-film electronic and microelectronic device research
- Corrosion-resistant and wear-resistant coatings for tools and components
- Decorative metallic films on glass, plastics, and metal substrates
- Chromium-based hard masks and patterning layers in lithography research
- Thin-film optical and reflective coating development
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