Chromium (Cr) sputtering targets are solid metallic plates used in physical vapor deposition (PVD) to deposit thin chromium films onto substrates. Chromium is a hard transition metal, and sputtering targets made from it serve as the source material in vacuum deposition systems that build up controlled, uniform coatings layer by layer.
- 1 piece
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- Adhesion and seed layers in multilayer thin-film stacks
- Hard, corrosion-resistant protective and decorative coating research
- Thin-film electronics and microfabrication experiments
- Optical and reflective coating development
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