Chromium oxide (Cr2O3) sputtering targets are ceramic oxide source materials used in physical vapor deposition (PVD) to form thin films. Chromium(III) oxide is a chromium-based oxide valued for its hardness and chemical stability. The listing also references indium, which is commonly associated with bonding a target to a backing plate for better thermal contact during sputtering.
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- Deposition of protective and wear-resistant thin films in materials research
- Corrosion-resistant coating studies on metal and glass substrates
- Optical and dielectric thin-film development
- Fundamental research on oxide thin films and their electronic properties
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