Chromium oxide (Cr2O3) sputtering targets are ceramic oxide source materials used in physical vapor deposition (PVD) to form thin films. Chromium oxide belongs to the transition metal oxide group and is valued for its chemical stability. This listing also references indium, which is commonly used as a bonding material to attach ceramic targets to backing plates. Please confirm the exact bonding configuration with AMI Scientific.
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- Thin-film deposition research on oxide coatings
- Protective and functional coating studies
- Optical thin-film development
- Thin-film electronics and resistive switching research
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