This chromium oxide (Cr2O3) sputtering target from Nanografi is a 4'' disc, 0.250'' thick, with a purity of 99.8%-99.9%. It serves as the source material for depositing Cr2O3 thin films by sputtering, where material eroded from the target builds up on a substrate such as a silicon wafer.
Sputter deposition is repeatable and scales from small R&D work to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure, and reactions may take place at the target surface, in flight or on the substrate.
Cr2O3 films combine high hardness with low friction coefficients, making them a candidate to replace transition metal nitrides or Al2O3 in specialised uses. They are also important in optical and electrical devices, including integrated circuits and flat panel displays, and as protective hard coatings in magnetic recording.
- Deposition of chromium oxide thin films on substrates such as silicon wafers.
- Hard, low-friction coatings as an alternative to transition metal nitrides or Al2O3.
- Thin films for integrated circuits, flat panel displays and optical devices.
- Corrosion- and wear-resistant coatings for magnetic heads and media, such as digital compact cassette (DCC) heads.
- Sputter etching where high etching anisotropy is required.
- Depth analysis by sputtering in secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.8%-99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CH17
- Material: Chromium Oxide (Cr2O3)
- Size: 4''
- Thickness: 0.250''
- Product code: NG0ST01CH17
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