Chromium Oxide (Cr2O3) sputtering targets are solid source plates used in physical vapor deposition (PVD) to produce thin films. Chromium oxide is a ceramic compound of chromium and oxygen, belonging to the metal oxide family. It is valued for its hardness, chemical stability, and optical properties.
- Quantity: 1 piece
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- Deposition of protective and wear-resistant thin films in materials research
- Fabrication of optical and decorative coatings
- Development of dielectric and insulating layers for electronic device research
- Surface modification studies for corrosion resistance
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