Chromium oxide (Cr2O3) sputtering targets are dense ceramic oxide plates used as source material in physical vapor deposition (PVD) sputtering systems. Chromium oxide belongs to the transition metal oxide family, known for its hardness, chemical stability, and optical properties. During sputtering, energetic ions bombard the target surface, ejecting atoms that condense onto a substrate to form thin films.
- Quantity: 1 piece
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- Protective and wear-resistant thin-film coatings
- Corrosion-resistant layers on metal and glass substrates
- Optical and decorative coatings research
- Resistive and dielectric thin-film studies in electronics
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