This Nanografi chromium oxide (Cr2O3) sputtering target is a 3'' disc, 0.125'' thick, with a purity of 99.8%-99.9%. It serves as the source material in sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputter deposition is repeatable and works for small research and development projects as well as production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.
Cr2O3 films combine high hardness with low friction coefficients, which makes them a candidate to replace transition metal nitrides or Al2O3 in special applications. Chromium oxide thin films are also needed in many integrated circuits, flat panel displays and optical devices, and have been developed as protective coatings for magnetic recording heads.
- Deposition of hard, low-friction chromium oxide thin films as an alternative to transition metal nitrides or Al2O3 coatings.
- Production of chromium oxide thin films for integrated circuits and flat panel displays.
- Optical and electrical thin-film coatings for optical devices.
- Wear and corrosion protection coatings for magnetic heads and media, such as the tape bearing surface of digital compact cassette (DCC) heads.
- Sputter etching where high etching anisotropy is required.
- Material analysis by sputtering, as in secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.8%-99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CH30
- Material: Chromium Oxide (Cr2O3)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01CH30
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