Chromium oxide (Cr2O3) sputtering targets are solid ceramic source plates used in physical vapor deposition to produce thin films of chromium oxide. Chromium oxide belongs to the transition metal oxide group and is valued for its hardness, chemical stability, and optical properties. In sputtering, ion bombardment ejects material from the target onto a substrate, making this a common route for uniform film growth. Nanografi supplies these targets in its nanomaterial range for research-scale coating work.
- Quantity: 1 piece
For technical specifications, CoA, or quotations, contact AMI Scientific.
- Thin-film deposition for protective and wear-resistant coating research
- Optical coating development for thin-film interference layers
- Resistive and dielectric layer studies in microelectronics
- Surface chemistry studies using thin-film model systems
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