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Chromium Oxide (Cr2O3) Sputtering Targets

Chromium Oxide (Cr2O3) Sputtering Targets
Regular price Rp 30.225.000,00
Regular price Sale price Rp 30.225.000,00
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Chromium(III) oxide (Cr2O3) sputtering targets are dense ceramic plates made from chromium oxide, a stable inorganic compound in the family of transition metal oxides. They serve as source material in physical vapor deposition (PVD) systems, where sputtering transfers the target material onto a substrate to form thin films. Because of their chemical stability and hardness, chromium oxide films are widely studied in research on protective and functional coatings.

  • Quantity: 1 piece

Contact AMI Scientific for technical specifications, Certificate of Analysis (CoA), or a quotation.

  • Deposition of hard, wear-resistant, and corrosion-protective coatings
  • Optical thin films for coating and interference layer research
  • Dielectric and resistive thin-film layers in electronic device research
  • Thin-film studies in materials science and surface engineering laboratories

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