This cobalt (Co) sputtering target from Nanografi is a 2'' disc, 0.125'' thick, with 99.5% purity and an indium designation. It is intended for sputter deposition of cobalt thin films onto substrates such as silicon wafers, for example in the fabrication of microelectronic devices like microprocessors and DRAMs.
Sputtering removes material from the target and deposits it onto a substrate of varied shape and size. The process is repeatable, scales from small R&D work to production batches covering medium to large substrate areas, and its many adjustable parameters give experienced users close control over film growth and microstructure.
Cobalt, element 27, is a hard, lustrous, silver-gray metal. It is one of three room-temperature ferromagnets and has uniaxial symmetry, which makes it valuable for magnetic and digital recording. It is also used in wear-resistant, high-strength and corrosion-resistant alloys.
- Deposition of cobalt thin films on microelectronic devices such as microprocessors and DRAMs.
- Preparation of cobalt layers for magnetic recording research.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Compositional analysis by sputtering, such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.5% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO13
- Material: Cobalt (Co)
- Size: 2''
- Thickness: 0.125''
- Bonding: Indium
- Atomic number: 27
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