This cobalt (Co) sputtering target from Nanografi has a purity of 99.95%, a 2'' size and a thickness of 0.250'', and is supplied in indium form as one piece. It serves as the material source in sputter deposition, where atoms are eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Cobalt, element 27 with the symbol Co, is a hard, lustrous, silver-gray metal. It is one of only three ferromagnets at room temperature and has uniaxial symmetry, which is why it is valued in magnetic and digital recording. Cobalt readily forms alloys with other metals that offer temperature stability, strength, and resistance to wear and corrosion.
Sputtering is a repeatable process that scales from small research projects to production batches covering medium to large substrate areas. Its many adjustable parameters give experienced users a high level of control over film growth and microstructure, and cobalt targets are used to build thin films in microelectronic devices such as microprocessors and DRAMs.
- Deposition of cobalt thin films on substrates such as silicon wafers.
- Production of thin films for microelectronic devices such as microprocessors and DRAMs.
- Thin-film work related to magnetic recording, where cobalt's uniaxial ferromagnetism is useful.
- Sputter etching where high etching anisotropy is needed and selectivity is not a concern.
- Material analysis by sputtering, such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO14
- Material: Cobalt (Co)
- Size: 2''
- Thickness: 0.250''
- Type: Indium
- Atomic number: 27
- Product code: NG0ST01CO14
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