This cobalt (Co) sputtering target is a 99.95% pure disc measuring 1'' in size with a thickness of 0.125'', intended for depositing thin cobalt films by sputtering. In this process, material is eroded from the target and deposited onto a substrate such as a silicon wafer. Sputter deposition is repeatable, works on substrates of many shapes and sizes, and can move from small research projects to production batches covering medium to large areas.
Cobalt, element 27, is a hard, lustrous, silver-gray metal. It is one of only three ferromagnets at room temperature and has uniaxial symmetry, which makes it valuable for magnetic and digital recording. Cobalt alloys readily with other metals, giving materials known for high strength, wear and corrosion resistance and temperature stability.
Cobalt targets are suited to producing thin films on microelectronic devices such as microprocessors and DRAMs. In DC magnetron sputtering, efficiency depends on a magnetic field that traps electrons released from the target and directs them back toward the negatively charged target.
- Thin film deposition of cobalt onto substrates such as silicon wafers.
- Producing thin films on microelectronic devices such as microprocessors and DRAMs.
- Fabricating cobalt layers for magnetic and digital recording research.
- Sputter etching where high anisotropy is needed and selectivity is not a concern.
- Materials analysis by sputtering, as in secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO01
- Material: Cobalt (Co)
- Size: 1''
- Thickness: 0.125''
- Atomic number: 27
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