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Cobalt (Co) Sputtering Targets

Cobalt (Co) Sputtering Targets
Regular price Rp 5.609.000,00
Regular price Sale price Rp 5.609.000,00
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Cobalt (Co) sputtering targets are solid, plate-type source materials made of the ferromagnetic transition metal cobalt. They are used in physical vapor deposition (PVD) systems, where ions bombard the target surface and eject atoms that condense onto a substrate to form a thin film. Cobalt targets belong to the metallic sputtering target group and are commonly used in research on magnetic and electronic thin-film structures.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or a quotation, please contact AMI Scientific.

  • Deposition of magnetic thin films for magnetic recording and data storage research
  • Development of metallic contacts and interconnect layers in semiconductor device studies
  • Spintronics and magnetoresistive device research
  • Surface coating and thin-film process development in materials science laboratories

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