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Cobalt (Co) Sputtering Targets

Cobalt (Co) Sputtering Targets
Regular price Rp 6.422.000,00
Regular price Sale price Rp 6.422.000,00
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Cobalt (Co) sputtering targets are solid metal plates used as the source material in physical vapor deposition (PVD). During sputtering, energetic ions bombard the target surface, ejecting cobalt atoms that deposit onto a substrate to form thin metallic films. Cobalt is a transition metal valued for its magnetic and mechanical properties, so these targets are commonly used in thin-film research and development.

  • Quantity: 1 piece

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  • Magnetic thin films for data storage and recording media research
  • Magnetic multilayer and spintronic device development
  • Conductive and barrier layers in microelectronics prototyping
  • Surface science and coating studies in academic and industrial laboratories

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