Cobalt (Co) sputtering targets are solid metallic cobalt plates used as source material in physical vapor deposition, where sputtering bombards the target surface to eject atoms that form a thin film on a substrate. Cobalt is a ferromagnetic transition metal, so these targets belong to the metal sputtering target category commonly used in thin-film research and development.
- Quantity: 1 piece
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- Deposition of magnetic thin films for research on magnetic recording and data storage
- Fabrication of multilayer structures for spintronics and magnetoresistive device studies
- Preparation of metallic electrode and adhesion layers in thin-film device prototyping
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