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Cobalt (Co) Sputtering Targets

Cobalt (Co) Sputtering Targets
Regular price Rp 29.335.000,00
Regular price Sale price Rp 29.335.000,00
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Cobalt (Co) sputtering targets are solid, high-density cobalt metal plates used as the source material in physical vapor deposition (PVD) sputtering systems. As a transition metal with ferromagnetic behavior, cobalt targets are widely used to deposit thin metallic films for research and industrial thin-film processes.

  • Quantity: 1 piece

For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.

  • Magnetic thin-film research for recording and sensor structures
  • Spintronics and magnetic multilayer device development
  • Metallic contact and interlayer films in thin-film electronics research
  • Adhesion and barrier layer studies in coating development

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