This cobalt (Co) sputtering target is supplied as a single piece with 99.95% purity, a size of 8'' and a thickness of 0.250''. It serves as the source material for sputter deposition of cobalt thin films onto substrates such as silicon wafers.
Sputter deposition works with many substrate shapes and sizes, gives repeatable results and can move from small R&D runs to production batches covering medium to large substrate areas. Its many process parameters give experienced users close control over film growth and microstructure.
Cobalt (atomic number 27) is a hard, lustrous, silver-gray metal. It is one of only three room-temperature ferromagnets and has uniaxial symmetry, which makes it important for magnetic and digital recording. Cobalt films are also used in microelectronic devices such as microprocessors and DRAMs.
- Deposition of cobalt thin films on substrates such as silicon wafers.
- Producing thin films for microelectronic devices such as microprocessors and DRAMs.
- Preparing magnetic layers for magnetic and digital recording research.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by sputtering, such as secondary ion mass spectrometry (SIMS).
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO12
- Material: Cobalt (Co)
- Size: 8''
- Thickness: 0.250''
- Atomic number: 27
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