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Cobalt Iron Boron (Co-Fe-B) Sputtering Targets

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets
Regular price Rp 17.917.000,00
Regular price Sale price Rp 17.917.000,00
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Cobalt Iron Boron (Co-Fe-B) sputtering targets are solid alloy plates used as the source material in physical vapor deposition (PVD) sputtering systems. Co-Fe-B is a ferromagnetic metal alloy from the transition-metal alloy family, and it is widely studied for depositing thin films with soft magnetic behavior. Sputtering targets of this type are used to transfer the alloy composition onto substrates in a controlled vacuum process.

  • Quantity: 1 piece

For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.

  • Research on magnetic thin-film layers for data storage and recording
  • Spintronics and magnetic tunnel junction (MTJ) device development
  • Soft magnetic coatings for sensor and microelectronic research
  • Academic and laboratory studies of magnetic thin-film deposition

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