Cobalt Iron Boron (Co-Fe-B) sputtering targets are solid metallic alloy sources composed of cobalt, iron, and boron, designed for physical vapor deposition (PVD) processes such as magnetron sputtering. As a ferromagnetic alloy in the metal and alloy target category, Co-Fe-B is widely studied for depositing thin films with magnetic functionality.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Deposition of magnetic thin films for spintronics research
- Fabrication of free and reference layers in magnetic tunnel junction (MTJ) structures
- Development of magnetic random-access memory (MRAM) prototypes
- Magnetic sensor and soft magnetic coating research
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