This Nanografi cobalt iron boron (Co-Fe-B) sputtering target is a 99.9% purity alloy target measuring 2'' in size with a thickness of 0.125''. It is intended for sputter deposition, where material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputter deposition gives repeatable results and scales from small R&D work to production batches covering medium to large substrate areas. Its many process parameters give experienced users considerable control over film growth and microstructure.
Boron alloys with transition metals such as cobalt and iron offer a high melting point and hardness, good wear and corrosion resistance, excellent electrical conductivity and resistance to attack by molten metals, which makes coatings from these materials attractive for improving the surfaces of metals and ceramics. Amorphous Fe-Co-B alloys also combine high mechanical hardness with soft magnetic behaviour.
- Thin film deposition of Co-Fe-B onto substrates such as silicon wafers.
- Protective surface coatings on metals and ceramics that benefit from hardness, wear and corrosion resistance.
- Development of soft magnetic films and components such as transformer cores and toroids.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis by sputtering, such as secondary ion mass spectrometry (SIMS) depth studies.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.9% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO18
- Material: Cobalt Iron Boron (Co-Fe-B)
- Size: 2''
- Thickness: 0.125''
- Product code: NG0ST01CO18
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