This cobalt iron boron (Co-Fe-B) sputtering target is an alloy target with 99.95% purity, supplied at a size of 3'' and a thickness of 0.125''. It serves as the source material for depositing Co-Fe-B thin films onto substrates such as silicon wafers by sputtering.
Sputter deposition is a repeatable technique that works on substrates of many shapes and sizes, and it scales from small research projects up to production batches covering medium to large areas. Its many process parameters give experienced users close control over film growth and microstructure.
Borides of transition metals such as cobalt iron boron offer a high melting point, hardness, good wear and corrosion resistance, excellent electrical conductivity and resistance to attack by molten metals, making them interesting for surface-enhancing coatings on metals and ceramics. Amorphous iron-cobalt-boron alloys also combine high mechanical hardness with soft magnetic behaviour.
- Thin film deposition of Co-Fe-B onto substrates such as silicon wafers.
- Coatings that improve the surface properties of metals and ceramics.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Materials analysis such as secondary ion mass spectrometry (SIMS).
- Development of soft magnetic alloy layers related to transformer cores and toroids.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.95% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01CO21
- Material: Cobalt Iron Boron (Co-Fe-B)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01CO21
—
—