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Cobalt Iron Boron (Co-Fe-B) Sputtering Targets

Cobalt Iron Boron (Co-Fe-B) Sputtering Targets
Regular price Rp 22.832.000,00
Regular price Sale price Rp 22.832.000,00
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Cobalt Iron Boron (Co-Fe-B) sputtering targets are solid source materials used in physical vapor deposition (PVD) to produce thin films by sputtering. Co-Fe-B is a ferromagnetic alloy of cobalt, iron, and boron, belonging to the family of magnetic metallic alloys frequently investigated for thin-film magnetic layers. The target is supplied as a sputtering source for laboratory and research-scale deposition systems.

  • Quantity: 1 piece

For technical specifications, Certificate of Analysis (CoA), or quotation, please contact AMI Scientific.

  • Magnetic thin-film research and development
  • Spintronics and magnetic tunnel junction layer studies
  • Magnetic recording media research
  • Thin-film deposition process development and optimization

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