Copper (Cu) sputtering targets are solid metal source plates used in physical vapor deposition (PVD) to deposit thin copper films onto substrates. Copper is a transition metal known for its good electrical and thermal conductivity, which makes it a common material in thin-film research and device fabrication.
- Quantity: 1 piece
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- Thin-film deposition for microelectronics and interconnect research
- Conductive layer development for printed and flexible electronics prototypes
- Thermal management and reflective coating studies
- Adhesion and diffusion barrier research in multilayer thin-film stacks
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