Copper (Cu) sputtering targets are solid source plates made of metallic copper, used in physical vapor deposition (PVD) processes such as DC and RF magnetron sputtering. As a metal in the conductive metallic element group, copper is widely studied for its electrical and thermal conductivity. Nanografi supplies this target for laboratory-scale thin-film research.
- 1 piece
Contact AMI Scientific for technical specifications, CoA, or quotations.
- Conductive seed and interconnect layer research in thin-film electronics
- Thin-film electrode development for electronic and energy devices
- Metallization studies for surface and interface engineering
- Coating research for optical and decorative metallic films
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