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Copper (Cu) Sputtering Targets

Copper (Cu) Sputtering Targets
Regular price Rp 4.796.000,00
Regular price Sale price Rp 4.796.000,00
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Copper (Cu) sputtering targets are solid metal plates designed for sputter deposition, a physical vapor deposition technique that forms thin copper films on substrates. As a metallic material, copper is valued for its electrical and thermal conductivity, which makes these targets a common choice for thin-film research and development.

  • Quantity: 1 piece

For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.

  • Deposition of conductive copper layers for electronic device prototyping
  • Seed layer studies for metallization in semiconductor research
  • Functional thin-film coatings for materials science experiments
  • Interconnect and wiring process development in microfabrication

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