Copper (Cu) sputtering targets are solid metal plates designed for sputter deposition, a physical vapor deposition technique that forms thin copper films on substrates. As a metallic material, copper is valued for its electrical and thermal conductivity, which makes these targets a common choice for thin-film research and development.
- Quantity: 1 piece
For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.
- Deposition of conductive copper layers for electronic device prototyping
- Seed layer studies for metallization in semiconductor research
- Functional thin-film coatings for materials science experiments
- Interconnect and wiring process development in microfabrication
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