Copper (Cu) sputtering targets are solid source plates made from elemental copper, a metal widely studied within the nanomaterial category. They serve as the source material in physical vapor deposition (PVD) processes, where ion bombardment ejects copper atoms that condense onto a substrate to form thin films.
- Quantity: 1 piece
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- Conductive thin-film layers for electronics research and prototyping
- Metallization studies for interconnects and contact structures
- Optical and decorative coatings on glass and polymer substrates
- Surface science and thin-film growth experiments in university laboratories
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