This Germanium (Ge) sputtering target from Nanografi is a high-purity source material for physical vapour deposition of thin films. It is supplied at 99.999% purity, with a size of 3'' and a thickness of 0.250'', as a single piece.
Sputter deposition erodes material from the target and deposits it onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results and scales from small research and development runs to production batches covering medium to large substrate areas. Depending on the process parameters, chemical reactions may take place on the target surface, in flight or on the substrate, giving experienced users considerable control over film growth and microstructure.
Beyond deposition, sputtering targets are also used in sputter etching and in surface analysis techniques that remove material at a controlled rate.
- Deposition of germanium thin films onto substrates such as silicon wafers.
- Sputter etching where a high degree of etching anisotropy is required and selectivity is not a concern.
- Secondary ion mass spectrometry (SIMS) analysis, where constant-rate sputtering allows composition and trace impurities to be determined.
- Research on sputtering as a form of space weathering on airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01GE05
- Material: Germanium (Ge)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01GE05
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