Germanium (Ge) is a metalloid semiconductor element widely studied in electronics, photonics, and optical materials. Germanium sputtering targets are solid source plates used in physical vapor deposition (PVD), where energetic ions eject atoms from the target surface so they condense onto a substrate as a thin film. This process allows researchers and manufacturers to build controlled germanium layers for experimental and device-oriented work. Nanografi germanium sputtering targets belong to the nanomaterial category and are intended for laboratory and pilot-scale thin-film processes.
- Quantity: 1 piece
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- Semiconductor thin-film research and device prototyping
- Infrared and optical coating development
- Photovoltaic and thin-film solar cell research
- Microelectronics process development
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