This Nanografi indium (In) sputtering target is a high-purity source material for depositing thin films by sputtering. It has a purity of 99.999%, a size of 3'' and a thickness of 0.125'', and is supplied as a single piece.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The method works with substrates of many shapes and sizes, gives repeatable results, and can move from small R&D work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions can take place at the target surface, in flight or on the substrate. Because so many parameters are involved, the process is complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of indium thin films onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is needed and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN10
- Material: Indium (In)
- Size: 3''
- Thickness: 0.125''
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