This Indium (In) sputtering target from Nanografi is a high-purity source material for physical vapour deposition. It has a purity of 99.999%, a size of 4'' and a thickness of 0.125'', and is supplied as a single piece.
In sputter deposition, material is eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results, and scales from small research and development work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions can take place at the target surface, in flight, or on the substrate. The large number of adjustable parameters makes sputtering a complex process, but it gives experienced users close control over film growth and microstructure.
- Deposition of indium thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis by secondary ion mass spectrometry (SIMS), where sputtered atoms are identified and measured to determine composition and detect trace impurities.
- Research and development work that can later be scaled up to medium and large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.999% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN14
- Material: Indium (In)
- Size: 4''
- Thickness: 0.125''
- Product code: NG0ST01IN14
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