Indium oxide (In2O3) sputtering targets are solid ceramic discs used as source material in physical vapor deposition. In2O3 is an n-type metal oxide semiconductor with a wide bandgap, widely studied as a transparent conductive oxide, often combined with tin oxide. During sputtering, energetic ions bombard the target surface and eject atoms that condense on a substrate to form a thin film.
- 1 piece
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- Deposition of transparent conductive thin films for display and solar cell research
- Fabrication of thin-film transistors and oxide semiconductor layers
- Development of gas sensing coatings
- Optoelectronic device prototyping
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