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Indium Oxide (In2O3) Sputtering Targets

Indium Oxide (In2O3) Sputtering Targets
Regular price Rp 11.414.000,00
Regular price Sale price Rp 11.414.000,00
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Indium oxide (In2O3) is an n-type metal oxide semiconductor with a wide bandgap, widely used as a source material for physical vapor deposition. Sputtering targets are solid ceramic plates that serve as the source for magnetron sputtering, where atoms are ejected from the target surface and deposited onto a substrate to form thin films. Indium oxide is a core component of transparent conductive oxide systems.

  • 1 piece

For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.

  • Transparent conductive films for flat-panel displays and touch panels
  • Electrodes for thin-film solar cells and optoelectronic devices
  • Channel and gas-sensing layers in thin-film research
  • Optical and functional coatings in materials science studies

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