This indium oxide (In2O3) sputtering target is a 99.99% purity source material, 1'' in size and 0.250'' thick, supplied as a single piece for thin film deposition by sputtering.
Sputtering builds thin films by eroding material from the target and depositing it onto a substrate such as a silicon wafer. The method handles a wide range of materials and substrate shapes and sizes. It is repeatable and scales from small R&D work to production batches covering medium to large substrate areas.
Depending on process parameters, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputter deposition complex, but it gives experienced users close control over film growth and microstructure.
- Deposition of indium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Material analysis such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and trace impurities.
- Research into space weathering processes affecting airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN36
- Material: Indium Oxide (In2O3)
- Size: 1''
- Thickness: 0.250''
- Product code: NG0ST01IN36
—
—