Indium oxide (In2O3) sputtering targets are ceramic source materials used in physical vapor deposition (PVD) to deposit thin films of indium oxide onto substrates. As an n-type metal oxide semiconductor, In2O3 belongs to the family of transparent conductive oxides (TCO), valued for combining optical transparency with electrical conductivity.
- Quantity: 1 piece
For technical specifications, certificates of analysis (CoA), or quotations, please contact AMI Scientific.
- Deposition of transparent conductive films for display and touch panel research
- Channel layers in oxide thin-film transistor studies
- Optoelectronic and photovoltaic device prototyping
- Development of gas sensing layers
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