This Nanografi indium oxide (In2O3) sputtering target is a 3'' disc with a thickness of 0.125'' and a purity of 99.99%. It serves as the source material in sputter deposition systems, where atoms are eroded from the target and deposited as a thin film onto a substrate such as a silicon wafer.
Sputtering is an established thin film technique that works with many materials and with substrates of varied shapes and sizes. The process is repeatable, so it can move from small R&D work to production batches covering medium to large substrate areas. Depending on process parameters, chemical reactions may take place at the target surface, in flight or on the substrate.
Because sputter deposition involves many adjustable parameters, it is a complex process, but it gives experienced users considerable control over film growth and microstructure.
- Deposition of indium oxide thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Material analysis by etching, as in secondary ion mass spectrometry (SIMS), to determine composition and detect very low impurity levels.
- Scaling thin film processes from research projects to production batches on medium to large substrates.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN39
- Material: Indium Oxide (In2O3)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01IN39
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