Indium oxide (In2O3) sputtering target is a ceramic oxide source material used in physical vapor deposition to form thin films. Indium oxide belongs to the transparent conducting oxide family, valued for combining optical transparency with electrical conductivity. Sputtering targets of this type are used as the source for depositing uniform films onto substrates in laboratory and pilot-scale processes.
- Quantity: 1 piece
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- Transparent conductive films for display and touch-panel research
- Thin-film transistor development for electronic devices
- Gas sensing layer fabrication for sensor research
- Optoelectronic and photovoltaic device prototyping
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