This indium oxide (In2O3) sputtering target from Nanografi is a 99.99% purity source material for thin film deposition. Each piece measures 3'' in size with a thickness of 0.250'', supplied as a single target.
Sputter deposition erodes material from the target and deposits it as a thin film onto a substrate such as a silicon wafer. The method works on substrates of many shapes and sizes, gives repeatable results, and can move from small research and development work to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate. The large number of adjustable parameters makes the process complex, but it gives experienced users fine control over film growth and microstructure.
- Depositing thin films onto substrates such as silicon wafers by sputtering.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Material analysis by sputtering, for example in secondary ion mass spectrometry (SIMS) to determine composition and detect trace impurities.
- Scaling sputter processes from research and development to medium and large area production batches.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN40
- Material: Indium Oxide (In2O3)
- Size: 3''
- Thickness: 0.250''
- Product code: NG0ST01IN40
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