Indium oxide (In2O3) sputtering target is a ceramic oxide source material used in physical vapor deposition processes. It belongs to the group of indium-based transparent conducting oxides, which combine optical transparency with electrical conductivity once deposited as thin films. Sputtering targets are supplied in solid form and are consumed gradually during deposition, so target density and uniformity play an important role in film quality.
- Quantity: 1 piece
For technical specifications, certificate of analysis (CoA), or quotation, please contact AMI Scientific.
- Deposition of transparent conductive oxide thin films for research
- Fabrication of optoelectronic devices such as displays and photodetectors
- Thin film solar cell and photovoltaic development
- Gas sensor layer development
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