This indium tin oxide (ITO, In203:Sn02) sputtering target from Nanografi is a 2'' target, 0.125'' thick, with a purity of 99.99%. It serves as the source material in sputter deposition, where material is eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Sputtering is an established way to coat substrates of many shapes and sizes. The process is repeatable, works for small research and development projects, and can be scaled to production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place on the target surface, in flight or on the substrate. The large number of adjustable parameters makes sputtering complex, but it gives experienced users fine control over film growth and microstructure.
- Deposition of ITO thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN47
- Material: Indium Tin Oxide/ITO (In203:Sn02)
- Size: 2''
- Thickness: 0.125''
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