This indium tin oxide (ITO, In203:Sn02) sputtering target from Nanografi is a 2'' disc, 0.250'' thick, with a purity of 99.99%. It serves as the source material in sputter deposition systems used to grow thin films on substrates such as silicon wafers.
In sputtering, material is eroded from the target and carried onto the substrate. The method handles a wide range of substrate shapes and sizes, gives repeatable results, and can move from small R&D work to production batches covering medium to large substrate areas.
Depending on the process parameters, chemical reactions may take place on the target surface, in flight, or on the substrate itself. Although the number of variables makes sputtering a complex process, it gives experienced users fine control over film growth and microstructure.
- Thin film deposition of ITO onto substrates such as silicon wafers.
- Sputter etching where highly anisotropic etching is required and selectivity is not critical.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect trace impurities.
- Scaling sputter processes from research projects to production batches on medium to large substrate areas.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN48
- Material: Indium Tin Oxide/ITO (In203:Sn02)
- Size: 2''
- Thickness: 0.250''
- Product code: NG0ST01IN48
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