This Nanografi indium tin oxide (ITO, In203:Sn02) sputtering target is a 3'' disc, 0.125'' thick, with 99.99% purity. It serves as the source material in sputter deposition systems, where material is eroded from the target and laid down as a thin film on a substrate such as a silicon wafer.
Sputter deposition works with many materials and on substrates of varied shape and size. Results are repeatable, and a process developed in small research projects can be scaled toward production batches covering medium to large substrate areas.
Depending on process settings, chemical reactions may take place at the target surface, in flight or on the substrate. The number of adjustable parameters makes sputtering demanding, but it gives experienced users fine control over film growth and microstructure.
- Deposition of ITO thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not critical.
- Analytical work such as secondary ion mass spectrometry (SIMS), where sputtered atoms are measured to determine composition and detect trace impurities.
- Research into space weathering processes that alter airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01IN49
- Material: Indium Tin Oxide/ITO (In203:Sn02)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01IN49
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