Iron sputtering targets are solid, sputter-ready forms of elemental iron, a transition metal widely used in materials science. They serve as the source material in physical vapor deposition (PVD) processes, where energetic ions bombard the target surface, ejecting atoms that condense onto a substrate to form thin films.
- 1 piece
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- Magnetic thin-film research for data storage and spintronics studies
- Fabrication of magnetic sensors and test structures
- Metallization and conductive layers in microelectronics research
- Surface and coating studies in laboratory settings
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