Iron (Fe) sputtering targets are solid metal source materials used in physical vapor deposition (PVD) processes, particularly magnetron sputtering, to deposit iron-based thin films onto substrates. Sputtering targets are engineered for uniform erosion and consistent film composition, which makes them a common choice for controlled deposition experiments. As a nanomaterial-category product from Nanografi, they are intended for laboratory-scale thin-film research and development.
- Quantity: 1 piece
Contact AMI Scientific for technical specifications, CoA, or a quotation.
- Deposition of magnetic thin films for spintronics and magnetic device research
- Development of conductive and metallic coatings on glass, silicon, or polymer substrates
- Fabrication of multilayer and alloy films in academic and industrial R&D
- Surface modification studies for catalytic and sensor layers
| Brand | — |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | — |
| Category | — |
| Pack sizes | — |
| Physical form | — |
| Storage | — |
—
—