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Iron (Fe) Sputtering Targets

Iron (Fe) Sputtering Targets
Regular price Rp 6.692.000,00
Regular price Sale price Rp 6.692.000,00
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Iron (Fe) sputtering targets are solid metallic plates used as the source material in physical vapor deposition (PVD) processes. Under ion bombardment in a vacuum chamber, atoms are ejected from the target surface and deposited onto a substrate to form thin films. As a ferromagnetic transition metal, iron is widely studied for magnetic and structural thin-film research.

  • 1 piece

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  • Magnetic thin-film layers for recording and spintronics research
  • Metallization and conductive layers for electronic device prototyping
  • Functional and protective coatings in materials science studies
  • Development of alloy and multilayer thin films

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