Iron (Fe) sputtering targets are solid, planar source materials made from metallic iron, a transition metal with ferromagnetic properties. They are used in physical vapor deposition (PVD) processes, where ions bombard the target surface in a vacuum chamber, ejecting iron atoms that condense onto a substrate to form thin films.
- Quantity: 1 piece
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- Deposition of magnetic thin-film layers for spintronics and magnetic recording research
- Metallization and adhesion layers in electronic and sensor device prototyping
- Development of protective and functional metallic coatings
- Catalytic and surface science studies using iron thin films
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