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Iron (Fe) Sputtering Targets

Iron (Fe) Sputtering Targets
Regular price Rp 5.454.000,00
Regular price Sale price Rp 5.454.000,00
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Iron (Fe) sputtering targets are solid metallic plates or discs made from iron, designed as the source material in physical vapor deposition (PVD) sputtering systems. During sputtering, energetic ions bombard the target surface and eject iron atoms, which then condense onto a substrate to form a thin film. Metal sputtering targets like this one are widely used in thin-film research and small-scale device development because they allow controlled, reproducible deposition of metallic layers.

  • Quantity: 1 piece

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  • Deposition of magnetic thin films for data storage and spintronics research
  • Fabrication of magnetic multilayers and sensor structures
  • Metallization and conductive layers in thin-film device prototyping
  • Surface and coating studies in materials science laboratories

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