This iron (Fe) sputtering target from Nanografi is a 99.99% pure source material for physical vapour deposition of thin iron films. It measures 3'' in size with a thickness of 0.125'' and is supplied as a single piece.
In sputter deposition, material is eroded from the target and deposited onto a substrate such as a silicon wafer. The technique works on substrates of many shapes and sizes, gives repeatable results, and can move from small R&D experiments to production batches covering medium to large areas.
Depending on the process settings, chemical reactions may take place at the target surface, in flight, or on the substrate. The large number of adjustable parameters makes sputtering demanding, but it gives experienced users fine control over film growth and microstructure.
- Deposition of iron thin films onto substrates such as silicon wafers.
- Sputter etching where high etching anisotropy is required and selectivity is not a concern.
- Compositional analysis by secondary ion mass spectrometry (SIMS), including detection of very low impurity concentrations.
- Research related to space weathering, in which sputtering alters the surfaces of airless bodies such as asteroids and the Moon.
| Brand | Nanografi |
|---|---|
| CAS number | — |
| Molecular formula | — |
| Purity | 99.99% |
| Category | — |
| Pack sizes | 1 piece |
| Physical form | — |
| Storage | — |
- Product code: NG0ST01FE12
- Material: Iron (Fe)
- Size: 3''
- Thickness: 0.125''
- Product code: NG0ST01FE12
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