Iron (Fe) sputtering targets are solid metallic plates designed for physical vapor deposition (PVD), in which magnetron or other sputtering systems eject iron atoms onto a substrate to form thin films. They belong to the metal sputtering target category and are used in laboratory-scale thin-film research and development.
- Quantity: 1 piece
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- Deposition of magnetic thin films for spintronics and magnetic storage research
- Seed and adhesion layers in microelectronics and thin-film device prototyping
- Model metallic coatings for corrosion and surface-science studies
- Fabrication of iron-based films for catalysis and sensor research
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